Precursors for silica or metal silicate films

Details Precursors for silica or metal silicate films Precursors for silica or metal silicate films

2006-06-20

2006-06-20

Price, Elvis O. (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

C556S400000

Reexamination Certificate

active

07064227

ABSTRACT:
A composition selected from the group consisting of bis(tert-butoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof; its use to form a metal or metalloid silicate layer on a substrate and the synthesis of the mixed alkoxysilanols.

REFERENCES:
patent: WO 02/27063 (2002-04-01), None
patent: WO 03/083167 (2003-10-01), None
Backer, et al, Esters Mixtes de L'Acide Tetrathio-Orthosilicique, Rec. Trav. Chim., 61, 1942, pp. 500-512.
Goedel, et al, Hyperbranched Poly(alkoxysilonanes), Polymer Preprints, 42(1), 2001, pp. 242-243.
Hausman, et al, Rapid Vapor Deposition of Highly Conformal Silica Nanoaluminates, Sci., vol. 298, 2002, pp. 402-406.
Muller, et al, Zur Darstellung von Alkoxy-und Alkoxysiloxy-silanolen, Z. Chem., 23, Jg. 1983, p. 252.
Schott, et al, Alkoxy-silanole-partielle Kieselsaureester, Z. Anorg. Allg. Chemie, 459, 1979, pp. 177-186.

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