Precision automatic mask-wafer alignment system

Details Precision automatic mask-wafer alignment system Precision automatic mask-wafer alignment system

1986-12-11

1988-03-01

Willis, Davis L.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 356401, G01B 902

Patent

active

047281936

ABSTRACT:
An interferometric alignment and position detector system for determining relative location of an object is provided. A composite diffraction grating is provided with the object. A laser can provide a collimated coherent light beam directed so as to impinge on the composite diffraction grating. A beam splitter can collect at least two pairs of diffracted light beams from the composite diffraction grating and can combine the pairs of diffracted light beams to provide interference fringe patterns. Apparatus is provided for detecting the interference fringe patterns to provide a measurement of the intensity distribution from which the relative location can be established.

REFERENCES:
patent: 4200395 (1980-04-01), Smith et al.
patent: 4595295 (1986-06-01), Welczynski
patent: 4596467 (1986-06-01), Bartelt
Flamholz et al., "High Resolution Mask Overlay Comparator", IBM Tech. Disclos. Bull., vol. 21, No. 7, pp. 2839-2844, 12/78.

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