Precision and apertures for lithographic systems

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C216S002000, C216S024000

Reexamination Certificate

active

07029830

ABSTRACT:
Aperture members are provided wherein there is thin 1–10 micrometer thick crystaline membrane that is surrounded by a frame of a bulk type crystalline material. The aperture being an opening through the membrane in a typical shape useful for device fabrication, such as a circle or pattern. The aperture member of the invention can be fabricated out of a typical silicon crystalline wafer in a process where doping in a region serves as an etch stop.

REFERENCES:
patent: 5972794 (1999-10-01), Katakura
patent: 2001/0016294 (2001-08-01), Yahiro
patent: 11-168049 (1999-06-01), None
Computer-generated translation of JP 11-168049 with abstract, Norihiro, Jun. 1999.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Precision and apertures for lithographic systems does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Precision and apertures for lithographic systems, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Precision and apertures for lithographic systems will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3569596

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.