Power trench gate FET with active gate trenches that are...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S332000, C257SE29201, C438S259000, C438S270000

Reexamination Certificate

active

07772642

ABSTRACT:
A trench-gated field effect transistor (FET) is formed as follows. Using one mask, a plurality of active gate trenches and at least one gate runner trench are defined and simultaneously formed in a silicon region such that (i) the at least one gate runner trench has a width greater than a width of each of the plurality of active gate trenches, and (ii) the plurality of active gate trenches are contiguous with the at least one gate runner trench.

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PCT, International Search Report of The International Searching Authority for Application No. PCT/US2006-061423, Nov. 28, 2008.
PCT Written Opinion of The International Searching Authority for Applicaton No. PCT/US2006-061423, Nov. 28, 2008.

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