Power supply for an ion implantation system

Details Power supply for an ion implantation system Power supply for an ion implantation system

2007-01-05

2009-08-18

Vanore, David A (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S492200, C250S492220, C250S492300, C315S111810, C315S111910, C315S20000A, C315S205000, C427S523000, C219S121210, C363S017000, C200S002000

Reexamination Certificate

active

07576337

ABSTRACT:
A power supply system for an ion implantation system. In one particular exemplary embodiment, the system may be realized as a power supply system that includes a low frequency power inverter, a stack driver and a high voltage power generation unit that receives source power from the power inverter. The high voltage generation unit may include a high voltage transformer for providing an output power that is multiplied to a desired output level and delivered to an input terminal of an ion beam accelerator. The power supply system may also include a dielectric enclosure that encases at least a portion of the high voltage power generation unit, thereby preventing variation in the break down strength of the internal components.

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