Power semiconductor device including insulated source...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S341000, C257S499000, C257S500000, C257SE29019, C257SE21544

Reexamination Certificate

active

07465986

ABSTRACT:
A power semiconductor device includes a plurality of trenches formed within a semiconductor body, each trench including one or more electrodes formed therein. In particular, according to embodiments of the invention, the plurality of trenches of a semiconductor device may include one or more gate electrodes, may include one or more gate electrodes or one or more source electrodes, or may include a combination of both gate and source electrodes formed therein. The trenches and electrodes may have varying depths within the semiconductor body.

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Buried Source Structure by Infineon.
Search Report and Office Action issued by the Taiwanese Patent Office in corresponding Taiwanese Application No. 94129325 dated Jan. 2008.

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