Power semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257330, H01L 2976

Patent

active

06137136&

ABSTRACT:
An injection enhanced insulated gate bipolar transistor is disclosed in which an average roughness of silicon on the side and bottom surfaces of trench grooves below a gate oxide film is made to be 0.6 nm or smaller. Irregular portions on the surface of silicon of the gate oxide film can be prevented. Thus, lowering of the gate breakdown voltage occurring because of dispersion of the thickness of the gate oxide film due to the irregular portions can be prevented.

REFERENCES:
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patent: 5656517 (1997-08-01), Efland et al.
patent: 5733810 (1998-03-01), Baba et al.
patent: 5780324 (1998-07-01), Tokura et al.
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patent: 5874751 (1999-02-01), Iwamuro et al.
patent: 5895952 (1999-04-01), Darwish et al.
Mitsuhiko Kitagawa, et al., "A 4500 V Injection Enhanced Insulated Gate Bipolar Transistor (IEGT) Operating in a Mode Similar to a Thyristor", IEDM Technical Digest, (1993), pp. 679-682.

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