Power monitor of RF plasma

Details Power monitor of RF plasma Power monitor of RF plasma

1991-12-30

1992-12-29

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323131, 333 32, H05H 124, H03H 738

Patent

active

051754720

ABSTRACT:
An RF plasma power monitor that monitor voltage, current and DC bias adjacent the plasma load and processes the sensed data in a digital data processor to provide true power at the load. Provision is also made for the control of an RF power source to maintain power at the load at a preset level irrespective on impedance fluctuations and reflections.

REFERENCES:
patent: 4207137 (1980-06-01), Tretola
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4622094 (1986-11-01), Otsubo
patent: 4629940 (1986-12-01), Gagne et al.
patent: 4935661 (1990-06-01), Heinecke et al.
patent: 4956582 (1990-09-01), Bourassa

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