Post last wiring level inductor using patterned plate process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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Details

C438S381000, C438S622000, C257S531000

Reexamination Certificate

active

07410894

ABSTRACT:
A method of forming a semiconductor structure, and the semiconductor structure so formed, wherein a transmission line, such as an inductor, is formed on a planar level above the surface of a last metal wiring level.

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