Post-exposure baking apparatus and related method

Details Post-exposure baking apparatus and related method Post-exposure baking apparatus and related method

2006-06-29

2010-11-09

Walke, Amanda C. (Department: 1795)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C165S080400, C165S218000, C165S267000

Reexamination Certificate

active

07828487

ABSTRACT:
A post-exposure baking apparatus comprising a supporting member, a heating member, and a cooling member is disclosed. A wafer is disposed on the supporting member and a photoresist layer is formed on the wafer. The heating member comprises electrical heating wires and is adapted to apply heat to the wafer to chemically amplify an acid generated in the photoresist layer through an exposure process using deep ultraviolet light. The cooling member is adapted to cool an outer edge of the wafer to suppress the amplification of the acid at the outer edge of the wafer.

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