Positive-working resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S913000, C526S242000, C526S280000, C526S281000

Reexamination Certificate

active

06939662

ABSTRACT:
A positive-working resist composition comprising:(A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and(B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.

REFERENCES:
patent: 2001/0038969 (2001-11-01), Hatakeyama et al.
patent: 1 142 928 (2001-10-01), None
patent: 1 273 969 (2003-01-01), None
patent: 1 341 038 (2003-09-01), None
patent: WO 00/17712 (2000-03-01), None
patent: WO 00/67072 (2000-11-01), None
patent: WO 01/37047 (2001-05-01), None
patent: WO 02/44814 (2002-06-01), None
patent: WO 02/077712 (2002-10-01), None
R.R. Kunz et al., “Outlook for 157-nm resist design” SPIE vol. 367 (1999), pp. 12-23.
Ralph R Dammel et al., “Transparent Resins for 157 nm Lithography” SPIE vol. 4345 (2001) pp. 350-360.
Raymond J. Hung et al., “Resist Materials for 157 nm Microlithography: An Update” SPIE vol. 4345 (2001), pp. 385-395.
Dirk Schmaljohann et al., “Design Strategies for 157 nm Single-Layer Photoresists: Lithographic Evaluation of a Poly(α-trifluoromethyl vinyl alcohol) Copolymer” SPIE vol. 3999 (2000), pp. 330-335.
Michael K. Crawford et al., “New Materials for 157 nm Photoresists: Characterization and Properties” SPIE vol. 3999 (2000), pp. 356-375.
Partial Search Report dated Oct. 15, 2003.
Vaishali R. Vohra et al., “Highly Transparent Resist Platforms for 157 nm Microlithography: An Update”, Proceedings of the SPIE, 2002, vol. 4690, No. 1, pp. 84-93.
Will Conley et al., “Dissolution Inhibitors for 157 nm Microlithography”, The International Society For Optical Engineering, 2002, vol. 4690, No. 1, pp. 69-75.
European Search Report dated May 18, 2004.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Positive-working resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive-working resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working resist composition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3448587

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.