Positive-working radiation-sensitive mixture and the production

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430326, 430330, 430905, 430910, 430921, 522 59, G03C 1492, G03F 730, G03F 738

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active

055630227

ABSTRACT:
A positive-working UV-sensitive mixture containing
(a1) an organic binder containing acid-labile ether, ester or carbonate groups or
(a2) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and
(a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, or

REFERENCES:
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3923514 (1975-12-01), Marsh
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 4996136 (1991-02-01), Houlihan et al.
patent: 5071730 (1991-12-01), Allen et al.
patent: 5118582 (1992-06-01), Ueno et al.
patent: 5202217 (1993-04-01), Todoko et al.
patent: 5318876 (1994-06-01), Schwalm et al.
patent: 5332650 (1994-07-01), Murata et al.
patent: 5344742 (1994-09-01), Sinta et al.
Cas Registry Search Jan. 6, 1994.
Reichmanis et al., Micro. Eng., vol. 14, pp. 215-226, Sep. , 1991.
Schlegel et al., Micro. Eng., vol. 14, pp. 227-236, Sep. , 1991.
Reichmanis et al., Chem. Mater., Mar. 1991, pp. 394-407.
Yamaoka et al., J. of Photopolymer Science and Tech., vol. 3, No. 3, 1990, pp. 275-280.
SPIE, vol. 1466, 1991, MacDonald et al., pp. 2-12.
SPIE, vol. 1466, 1991, Nalamasu et al., pp. 13-25.
Abstract of Japanese Patent 58-114030-A (Jul. 7, 1983).

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