Positive-working radiation-sensitive mixture and recording mater

Details Positive-working radiation-sensitive mixture and recording mater Positive-working radiation-sensitive mixture and recording mater

1996-07-22

1998-04-07

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430921, 430925, 430919, G03C 173

Patent

active

057362971

ABSTRACT:
The invention relates to a positive-working radiation-sensitive mixture containing a) a compound which forms acid when exposed to actinic radiation, b) a compound containing at least one C--O--C or C--O--Si bond which can be cleaved by said acid, and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions, wherein the compound a) comprises the structure of the formulae I, II or III: ##STR1## The radiation-sensitive mixture according to the invention is notable for a high resolution and a high sensitivity over a wide spectral range. It also has high thermal stability and does not form any corrosive photolysis products on exposure to light.
The invention furthermore relates to a radiation-sensitive recording material produced therefrom which is suitable for producing photoresists, electronic components, printed circuit boards or for chemical milling.

REFERENCES:
patent: 4387152 (1983-06-01), Stahlhofen
patent: 4690882 (1987-09-01), Tanigaki et al.
patent: 4840867 (1989-06-01), Elsaesser et al.
patent: 5364734 (1994-11-01), Pawloski et al.
Tsunooka et al, Mcintosh et al, Tetrahedron Letters 1967, 37.
Ueno et al, Chem. Amplification Positive Resist System Using Novel Sulfonates as Acid Generators, in: "Polymers for Micro-electronic--Science & Tech.", Hrsg. Y. Tabata et al, Kodansha-Weinheim-New York, 1989.
Houlihan et al, SPIE Proc., Adv. in Resit Techn. and Proc. 920 (1988) 67.

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