Positive-working radiation-sensitive mixture and production of r

Details Positive-working radiation-sensitive mixture and production of r Positive-working radiation-sensitive mixture and production of r

1996-09-09

1998-12-08

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430330, 430905, 522 25, 522 27, G03F 7039

Patent

active

058466894

ABSTRACT:
A positive-working radiation-sensitive mixture essentially consists of

REFERENCES:
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3923514 (1975-12-01), Marsh
patent: 4678737 (1987-07-01), Schneller et al.
patent: 5141969 (1992-08-01), Saeva et al.
patent: 5191124 (1993-03-01), Schwalm et al.
patent: 5318876 (1994-06-01), Schwalm et al.
patent: 5525453 (1996-06-01), Pryzbilla et al.
patent: 5605781 (1997-02-01), Gerlorme et al.
patent: 5635332 (1997-06-01), Nakano et al.
Crivello et al., J. of Polymer Sci., vol. 18, pp. 1021-1034, 1980.
Mack, Microlithography World, Spring 1995, pp. 20-21.

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