Positive-working photosensitive resin composition, method...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Screen other than for cathode-ray tube

Reexamination Certificate

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Details

C430S018000, C430S028000, C430S191000, C430S192000, C430S193000, C430S326000, C430S330000

Reexamination Certificate

active

10874592

ABSTRACT:
The invention provides a positive-working photosensitive resin composition comprising an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH2OH group but not a phenolic hydroxyl group, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device. Also, the present invention provides a positive-working photosensitive resin composition comprising an alkali soluble resin (A), a diazoquinone compound (B) and a mixture solvent of two or more kinds (D), wherein the mixture solvent (D) contains γ-butyrolactone and propylene glycol monoalkyl ether and the total amount of γ-butyrolactone and propylene glycol monoalkyl ether is about 70 wt % or more of the total amount of solvent, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device.

REFERENCES:
patent: 4339521 (1982-07-01), Ahne et al.
patent: 4880722 (1989-11-01), Moreau et al.
patent: 5106718 (1992-04-01), Bartmann et al.
patent: 5229245 (1993-07-01), Lin et al.
patent: 5296332 (1994-03-01), Sachdev et al.
patent: 5488182 (1996-01-01), Kobayashi et al.
patent: 5624781 (1997-04-01), Naruse et al.
patent: 6190841 (2001-02-01), Kihara et al.
patent: 6207356 (2001-03-01), Banba et al.
patent: 6376151 (2002-04-01), Takahashi et al.
patent: 6780561 (2004-08-01), Ueda et al.
patent: 2003/0149142 (2003-08-01), Yamanaka et al.
patent: 0 212 482 (1987-03-01), None
patent: 0 807 852 (1997-11-01), None
patent: 1 195 811 (2002-04-01), None
patent: 62-251740 (1987-11-01), None
patent: 1-46862 (1989-10-01), None
patent: 04009852 (1992-01-01), None

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