Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-07-27
2000-11-07
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302861, G03C 173
Patent
active
061434647
ABSTRACT:
Disclosed is a positive-type photosensitive composition comprising in predetermined blending proportions a substance which generates heat upon absorbing light, a resin which has phenolic hydroxyl groups and is soluble in an aqueous alkaline solution, and a copolymer comprising 10 mol % or more of at least one of acrylic derivatives having a sulfonamide group as a component for copolymerization. The above-described composition is designed for use with an infrared laser in a direct plate making process as a composition advantageous in that the problems of insufficient image forming ability and insufficient solvent resistance of the resin, which has phenolic hydroxyl groups and is soluble in an aqueous alkaline solution, are solved, and in that the range of locations where the photosensitive composition may be handled are not limited, and further in that the sensitivity of the photosensitive composition to the concentration of the developing solution is stable, i.e., there is a broad latitude in development.
REFERENCES:
patent: 5141838 (1992-08-01), Aoshima et al.
patent: 5840467 (1998-11-01), Kitatani et al.
patent: 5919601 (1999-07-01), Nguyen et al.
Database WPI, Section Ch, Week 9601, Derwent Publications Ltd., Oct. 1995.
Baxter Janet
Fuji Photo Film Co. , Ltd.
Gilmore Barbara
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