Positive working photosensitive composition

Details Positive working photosensitive composition Positive working photosensitive composition

1998-02-18

2000-03-28

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302701, 4302831, 4302841, 4302871, G03C 172, G03C 173

Patent

active

060429917

ABSTRACT:
A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

REFERENCES:
patent: 5738975 (1998-04-01), Nakano et al.
patent: 5879857 (1999-03-01), Chandross et al.

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