Positive working photosensitive composition

Details Positive working photosensitive composition Positive working photosensitive composition

1989-10-05

1991-03-26

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430286, 430287, 526287, 526284, 526280, 526266, 522 26, 522 34, 522 40, 522 47, G03F 7039, C08F 1232, C08F12802

Patent

active

050028537

ABSTRACT:
The present invention relates to a positive working photosensitive composition having an improved sensitivity due to the use of a sensitizer and having an excellent incandescent light safety. This composition comprises at least 1 molar % of a structural unit derived from at least one of monomers having the following general formulae: ##STR1## wherein: R.sub.1 represents a hydrogen atom, an alkyl group or a substituted alkyl group,

REFERENCES:
patent: 4425424 (1984-01-01), Altland et al.
patent: 4957988 (1990-09-01), Irving et al.

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