Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-03-11
1992-04-14
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, G03C 173, G03F 7039
Patent
active
051047705
ABSTRACT:
A photolithographic resist with sensitivity for actinic radiation in the short wavelength, ultraviolet region is produced from (1) an organic film-forming material, and (2) an oxime carboxylate ester which releases a carboxylic acid on exposure to deep ultraviolet radiation, thereby rendering the composition more soluble in a developer in the exposed regions than in the unexposed regions. A process for the formation of an image is also disclosed comprising (1) exposing the above composition to actinic radiation in a pre-determined pattern and (2) treating the composition with aqueous base developer to remove the exposed areas. The image-forming process may be used in the production of printing plates and microelectronic circuits.
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Hasebe, M., Kogawa, K. and Tsuchiya, T., "Photochemical Arylation by Oxime Esters in Benzene and Pyridine: Simple Synthesis of Biaryl Compounds", Tetrahedron Letters, vol. 25, No. 35, pp. 3887-3890, 1984.
Kelly Michael G.
Usifer Douglas A.
Crall Hugh C.
Hoechst Celanese Corporation
McCamish Marion E.
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