Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-10-31
1993-12-28
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, G03F 7023, G03C 161
Patent
active
052738566
ABSTRACT:
Positive photoresist compositions which comprise an alkali soluble resin material, a diazoquinone dissolution inhibitor which decompose on exposure to mid and near UV radiation, and a sulfonic acid ester of an imide or oxime which does not absorb such mid or near UV radiation. Resist images of high contrast are formed.
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Lyons Christopher F.
Perreault Stanley E.
Spinillo Gary T.
Wood Robert L.
Bowers Jr. Charles L.
Crockatt Dale M.
International Business Machines - Corporation
Stemwedel John A.
Young Christopher G.
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