Positive-working photoresist composition and method for forming

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430 23, 430 25, 430 28, 430540, 430909, G03C 500, G03C 1495

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active

045460647

ABSTRACT:
A positive-working photoresist composition is described comprising a solution of polyvinyl alcohol, an inorganic ferric salt, ammonium trioxalatoferrate and a diol such as 1,4-butanediol. There is also described the addition of a finely divided black pigment to such a composition and the use of such a black pigmented composition for the formation of a light-absorbing matrix in a color CRT screen structure.

REFERENCES:
patent: 2459136 (1949-01-01), Slifkin
patent: 3183094 (1965-05-01), Cerwonka et al.
patent: 3620735 (1971-11-01), Ulano
patent: 3804621 (1974-04-01), McIntosh
patent: 4049452 (1977-09-01), Nekut
patent: 4221859 (1980-09-01), Fanger et al.
patent: 4288513 (1981-09-01), Kilichowski et al.
patent: 4339528 (1982-07-01), Goldman
patent: 4505999 (1985-03-01), Bergamo et al.

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