Positive-working photoresist composition and method for forming

Details Positive-working photoresist composition and method for forming Positive-working photoresist composition and method for forming

1983-11-04

1985-10-08

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430 23, 430 25, 430 28, 430540, 430909, G03C 500, G03C 1495

Patent

active

045460647

ABSTRACT:
A positive-working photoresist composition is described comprising a solution of polyvinyl alcohol, an inorganic ferric salt, ammonium trioxalatoferrate and a diol such as 1,4-butanediol. There is also described the addition of a finely divided black pigment to such a composition and the use of such a black pigmented composition for the formation of a light-absorbing matrix in a color CRT screen structure.

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patent: 3620735 (1971-11-01), Ulano
patent: 3804621 (1974-04-01), McIntosh
patent: 4049452 (1977-09-01), Nekut
patent: 4221859 (1980-09-01), Fanger et al.
patent: 4288513 (1981-09-01), Kilichowski et al.
patent: 4339528 (1982-07-01), Goldman
patent: 4505999 (1985-03-01), Bergamo et al.

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