Positive working dry film element having a layer of resist compo

Details Positive working dry film element having a layer of resist compo Positive working dry film element having a layer of resist compo

1990-04-10

1991-12-31

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430326, 522 31, 522127, 522154, G03C 176

Patent

active

050771744

ABSTRACT:
This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.

REFERENCES:
patent: 4316046 (1982-04-01), Dossell
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4898803 (1990-02-01), Aoai et al.
patent: 4951379 (1990-06-01), Brunsvold et al.

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