Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-03-15
2011-03-15
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S907000, C430S914000, C430S942000, C430S966000, C526S242000, C526S247000
Reexamination Certificate
active
07906269
ABSTRACT:
Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2),wherein R3represents a fluorine atom or fluorine-containing alkyl group, each of W and W1independently represents a bivalent linking group, R2represents an acid-labile protecting group, each of R4, R5and R6independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4, R5, R6and W or W1may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.
REFERENCES:
patent: 2007/0275326 (2007-11-01), Hatakeyama et al.
patent: 2007/0292802 (2007-12-01), Sato
patent: 1-242551 (1989-09-01), None
patent: 2005-75859 (2005-03-01), None
patent: 2006-65071 (2006-03-01), None
E. Ann Hallinan et al., “2, 2-Difluoro-3-Hydroxyesters by Reformatskii Reaction”, Tetrahedron Letters, vol. 25, No. 22, pp. 2301-2302, 1984.
Isono Yoshimi
Jodry Jonathan Joachim
Narizuka Satoru
Yamanaka Kazuhiro
Central Glass Company Limited
Crowell & Moring LLP
Lee Sin J.
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