Positive type radiosensitive composition and method for...

Details Positive type radiosensitive composition and method for... Positive type radiosensitive composition and method for...

2006-02-28

2006-02-28

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S331000, C430S321000

Reexamination Certificate

active

07005231

ABSTRACT:
A positive-tone radiation-sensitive composition including: (A) at least one compound selected from the group consisting of a hydrolyzable silane compound represented by general formula (R1)pSi(X)4−p(wherein R1is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer from 0 to 3), hydrolyzates thereof and condensates thereof; (B) a photoacid generator; and (C) a basic compound. A cured product that is excellent in terms of pattern precision and so on can be obtained by using the composition. The composition can be used as a material for forming optical waveguides.

REFERENCES:
patent: 6576393 (2003-06-01), Sugita et al.
patent: 6641963 (2003-11-01), Rangarajan et al.
patent: 6803169 (2004-10-01), Cameron et al.
patent: 7-258604 (1995-10-01), None
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patent: 2000-056453 (2000-02-01), None
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patent: 2001-083710 (2001-03-01), None
Machine-assisted English translation of JP 07-258604 (Yamaho et al) provided by JPO.
Full, formal English translation of JP 7-258604 (Yamaho et al), provided by PTO.

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