Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-07-19
2005-07-19
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S296000
Reexamination Certificate
active
06919157
ABSTRACT:
The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same.a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1)(R1and R2are aromatic rings, and R3represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R1to R3may be the same or different.)a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2)(R4to R6are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4to R6is an aromatic ring with an electron-donating group. R4to R6may be the same or different.)a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b.With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.
REFERENCES:
patent: 5688628 (1997-11-01), Oie et al.
patent: 5962185 (1999-10-01), Park et al.
patent: 5989775 (1999-11-01), Park et al.
patent: 0 908 473 (1999-04-01), None
patent: 3-98051 (1991-04-01), None
patent: 4-136856 (1992-05-01), None
patent: 07295221 (1995-11-01), None
patent: 10-171122 (1998-06-01), None
patent: 10-287712 (1998-10-01), None
patent: WO 00/16160 (2000-03-01), None
English language abstract of JP 04-136856.
English language abstract of JP 7-295221.
Niwa Hiroyuki
Senoo Masahide
Tamura Kazutaka
Morrison & Foerster / LLP
Toray Industries Inc.
Walke Amanda
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