Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-06-18
1993-05-25
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 525212, 526287, G03F 7039
Patent
active
052139468
ABSTRACT:
A novel positive type photosensitive resinous composition comprising a base resin having in at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: ##STR1## in which R.sub.1 and R.sub.2 are the same or different groups and each represents hydrogen atom, alkyl, acyl, phenyl, naphthyl, anthryl or benzyl group and R.sub.1 and R.sub.2, taken together with the carbon atom, may be an alicyclic ring, the composition further comprising a group containing an acid-decomposable bond, the content of said iminosulfonate group being 1.times.10.sup.-5 to 3.times.10.sup.-3 equivalent/g of the base resin. The present composition, when irradiated with radiation with 200 to 400 nm wavelength, can generate strong sulfonic acid groups, and is specifically useful as a photoresist for a circuit board, integrated circuit and the like.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4736055 (1988-04-01), Dietliker et al.
patent: 4869995 (1989-09-01), Shirai et al.
patent: 4883740 (1989-11-01), Schwalm et al.
Ishikawa Katsukiyo
Nishijima Kanji
Shirai Masamitsu
Tsunooka Masahiro
Hamilton Cynthia
Nippon Paint Co. Ltd.
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