Positive type photosensitive epoxy resin composition and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S311000, C430S317000, C430S318000, C430S319000, C430S330000

Reexamination Certificate

active

07097958

ABSTRACT:
A positive type, photosensitive epoxy resin composition comprising (a) an epoxy resin having two or more epoxy groups in one molecule, (b) a modified phenolic resin having a triazine ring, (c) a latent basic curing agent and (d) a photosensitive acid generator; and a preferably multilayered printed circuit board of buildup mode using said composition as an insulating layer.

REFERENCES:
patent: 5124233 (1992-06-01), Meier et al.
patent: 2002/0016398 (2002-02-01), Osada et al.
patent: 0795570 (1997-09-01), None
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patent: 9-40751 (1997-02-01), None
patent: 10-36682 (1998-02-01), None
patent: 10-173336 (1998-06-01), None
patent: 11-1547 (1999-01-01), None
patent: 11-30855 (1999-02-01), None
patent: 11-87927 (1999-03-01), None
patent: 11-343398 (1999-12-01), None
patent: WO 99/41642 (1999-08-01), None

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