Positive type photosensitive anionic electrodeposition coating r

Details Positive type photosensitive anionic electrodeposition coating r Positive type photosensitive anionic electrodeposition coating r

1991-11-29

1993-07-27

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430327, 430910, 430919, 430921, 430935, 522 57, 522 59, 522 86, 522153, 2041806, 2041816, G03C 1492

Patent

active

052309843

ABSTRACT:
A resin composition comprising (A) a copolymer obtained by copolymerizing (a) acrylic acid and/or methacrylic acid, (b) at least one compound having an unstable group against an acid such as t-amyl acrylate, t-amyl methacrylate, etc. and (c) a copolymerizable monomer such as n-butyl acrylate and (B) a photoacid generator is effective for providing an electro-deposition bath good in water dispersion stability and an electrodeposited film having high sensitivity and high resolution.

REFERENCES:
patent: 5045431 (1991-09-01), Allen et al.
patent: 5071730 (1991-12-01), Allen et al.
patent: 5120629 (1992-06-01), Bauer et al.

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