Positive type photosensitive anionic electrodeposition coating r

Details Positive type photosensitive anionic electrodeposition coating r Positive type photosensitive anionic electrodeposition coating r

1992-11-27

1994-01-18

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 522 27, 522 31, 522 49, 522 50, 522 59, 522 63, G03C 1492

Patent

active

052799239

ABSTRACT:
A photosensitive resin composition comprising (a) a compound having a group unstable to acids, (b) a compound generating an acid when exposed to actinic light, and (c) a benzotriazole derivative is suitable for forming a positive type photosensitive anionic electrodeposition coating material and is usable for producing printed circuit boards.

REFERENCES:
patent: 5037721 (1991-08-01), Doessel
patent: 5093221 (1992-03-01), Chen et al.
patent: 5102771 (1992-04-01), Vogel et al.
patent: 5110708 (1992-05-01), Kim
patent: 5212046 (1993-05-01), Ganola et al.
patent: 5217843 (1993-06-01), Dammet et al.
patent: 5225316 (1993-07-01), Vogel et al.
patent: 5227276 (1993-07-01), Roeschekt et al.

Affiliated with

Also associated with

Rating

Positive type photosensitive anionic electrodeposition coating r does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive type photosensitive anionic electrodeposition coating r, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive type photosensitive anionic electrodeposition coating r will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1135600