Positive type photoresist developer

Details Positive type photoresist developer Positive type photoresist developer

1992-03-18

1992-12-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430165, 430192, 430326, 430330, 252405, G03F 732

Patent

active

051750783

ABSTRACT:
A positive type photoresist developer which comprises an aqueous solution of quaternary ammonium hydroxide represented by the general formula; ##STR1## (wherein all the symbols are as defined in the appended claims) and hydrazine or hydrazine and a nonionic surfactant is disclosed.
The developer can form a fine pattern having a high degree of resolution and can provide an excellent profile with few irregularities in pattern dimensions.

REFERENCES:
patent: 3255004 (1966-06-01), Thommes
patent: 4374920 (1983-02-01), Wanat et al.
patent: 4576903 (1986-03-01), Baron et al.
patent: 4784937 (1988-11-01), Tanaka et al.
patent: 4820621 (1989-04-01), Tanaka et al.
Chemical Abstracts, vol. 109, No. 8, Aug. 22, 1988, p. 657 Abstract No. 64360u, Columbus, Ohio, US; & JP-A-63 63 643 (Tama Kagaku Kogyo K.K.; Moses Lake Industries, Inc.) Mar. 22, 1988.
Chemical Abstracts, vol. 110, No. 26, Jun. 26, 1989, p. 659, Abstract No. 241174e, Columbus, Ohio, US; & JP-A-01 14 924 (Mitsubishi Gas Chemical Co., Inc.) Jan. 19, 1989.

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