Positive tone lithography in carbon dioxide solvents

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S331000

Reexamination Certificate

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06919167

ABSTRACT:
A method for carrying out positive tone lithography with a carbon dioxide solvent system is carried out by (a) providing a substrate having a polymer resist layer formed thereon; (b) exposing at least one portion of the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer; and then (c) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system preferably comprising a polar group, under conditions in which the at least one light field region is preferentially removed.

REFERENCES:
patent: 5532106 (1996-07-01), Fréchet et al.
patent: 5532113 (1996-07-01), Fréchet et al.
patent: 5536616 (1996-07-01), Fréchet et al.
patent: 5545509 (1996-08-01), Cameron et al.
patent: 5648196 (1997-07-01), Fréchet et al.
patent: 5665527 (1997-09-01), Allen et al.
patent: 6001418 (1999-12-01), DeSimone et al.
patent: 6083565 (2000-07-01), Carbonell et al.
patent: 6379874 (2002-04-01), Ober et al.
patent: 6737215 (2004-05-01), Dammel et al.
patent: 2002/0119398 (2002-08-01), DeSimone et al.
patent: 2003/0047533 (2003-03-01), Reid et al.
patent: 2004/0096779 (2004-05-01), DeSimone
K.Jackson et al.; “Surfactants and Microemulsions in Supercritical Fluids” ; in Supercritical fluid cleaning;ed.J.Hardy (Noyes) 1998, ch.5 pp. 87-120.
Sunderarajan et al. “Supercritical CO2 processing for submicron imaging of fluoropolymers”, Chem Mater, v12,(2000) pp. 41-48.
Cameron, James F., et al.,Photogeneration of amines from u-keto carbamates: design and preparation of photoactive compounds, J. Chem. Soc.,1:2429-2442 (1997).
Fréchet , Jean M.J.,et al.,Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation, Chem. Mater.,9: 2887-2893 (1997).
Havard, Jennifer M., et al.,Functional Design of Environmentally enhanced Water-Soluble Positive-Tone Photoresists, Polym. Mat. Sci. Eng.,77:424-5 (1997).
Pham, Victor Q., et al.,Positive-Tone Resist for Supercritical CO2Processing, Polymer Preprints,43(2): 885-6 (2002).
Urankar, Edward J., et al.,Photogenerated Base in Polymer Curing and Imaging: Design of Reactive Styrenic Copolymers Susceptible to a Base-Catalyzed β-Elimination, Journal of Polymer ScienceJournal of Polymer Science: Part A: Polymer Chemistry,35:3543-3552 (1997).
Urankar, Edward J., et al.,Photogenerated Base in Polymer Curing and Imaging: Cross-Linking of Base-Sensitive Polymers Containing Enolizable Pendant Groups, Chem. Mater.,9: 2861-2868 (1997).
Urankar, Edward J., et al.,Base-Sensitive Polymers as Imaging Materials: Radiation-Induced β-Elimination To Yield Poly(4-hydroxystyrene),Macromolecules,30: 1304-1310 (1997).
International Search Report for PCT/US03/36670; Date of Mailing Jan. 10, 2005.

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