Positive sensitive resin composition and a process for...

Details Positive sensitive resin composition and a process for... Positive sensitive resin composition and a process for...

2005-09-20

2005-09-20

Hamilton, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S288100, C430S326000

Reexamination Certificate

active

06946234

ABSTRACT:
A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3):where R1and R3are each independently hydrogen or methyl and R2is C1-C6straight or branched unsubstituted alkyl or C1-C6straight or branched substituted alkyl,wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.

REFERENCES:
patent: 4696886 (1987-09-01), Hanabata et al.
patent: 5079129 (1992-01-01), Roth et al.
patent: 5364738 (1994-11-01), Kondo et al.
patent: 5496678 (1996-03-01), Imai et al.
patent: 5556734 (1996-09-01), Yamachika et al.
patent: 6156477 (2000-12-01), Motomi et al.

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