Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-12-09
1987-05-12
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430311, 430313, 430323, 430176, 430914, 430921, 430922, 430925, 430919, G03C 516, G03C 1495, G03F 726
Patent
active
046650067
ABSTRACT:
A photoresist composition comprised of a radiation scissionable polymeric system having organopolysiloxane segments sensitized by an onium salt is disclosed. Useful organopolysiloxane containing polymers include polysiloxane-polycarbonate block copolymers, and polyorganosiloxane polyaryl esters. The resist films produced from the photoresist compositions exhibit high sensitivity, high thermal stability and resistance to oxygen reactive ion etching which makes them desirable for dry etching processes to enable submicron resolution.
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Khojasteh Mahmoud M.
Kwong Ranee W.
Sachdev Harbans S.
Sachdev Krishna G.
Hamilton Cynthia
International Business Machines - Corporation
Kittle John E.
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