Positive resist quaternary ammonium hydroxide containing develop

Details Positive resist quaternary ammonium hydroxide containing develop Positive resist quaternary ammonium hydroxide containing develop

1988-04-04

1990-04-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430326, 252156, 252528, 252529, 252547, 252548, 252559, G03C 524, G03C 534

Patent

active

049140060

ABSTRACT:
A positive resist developer comprising a solution containing a quaternary ammonium hydroxide, a cationic surfactant and a nonionic surfactant.

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Research Disclosure, Abstract #22713, 3/1983.

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