Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1983-02-03
1985-11-05
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
526245, 430326, 430330, 430327, 430296, 430942, 430967, 430331, G03C 1495, G03C 516, G03C 1802, G03C 1820
Patent
active
045514143
ABSTRACT:
The invention relates to positive resist materials of thermally crosslinkable methacrylic polymers soluble in organic solvents, which are characterized in that the methacrylic polymers are copolymers of 80 to 98 mol-% of fluoroalkylmethacrylate and 20 to 2 mol-% of methacrylic acid chloride or chloroalkylmethacrylate. The resists of the invention are very well suited for the transfer of microstructures, for example in semiconductor technology. They have, in addition to a high sensitivity, a very good mechanical stability and strength of adhesion.
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Tsuka Tada, "Crosslinked Poly(2,2,2-Trichloroethyl Methacrylate) as a Hig Sensitive Positive Electron Resist," Journal of the Electrochemical Society, vol. 126, No. 9, Sep. 1979, pp. 1635-1636.
Masami Kakuchi et al., "Poly (Fluoro Methacrylate) as Highly Sensitive, High Contrast Positive Resist", Journal of the Electrochemical Society, vol. 124, No. 10, Oct. 1977, pp. 1648-1651.
"Copolymers", Kirk-Othmer Encyclopedia of Chemical Technology, Third Edition, vol. 6, John Wiley & Sons, Inc., New York, 1979, pp. 798-799.
Gessner G. Hawley, ed., "Copolymer", The Condensed Chemical Dictionary, Eighth Edition, Van Nostrand Reinhold Company, New York, 1971, p. 233.
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Asmussen Frithjof
Chen Jiang-Tsun
Schnabel Wolfram
Sotobayashi Hideto
Hamilton Cynthia
Kittle John E.
Max-Planck-Gesellshaft zur Forderung der Wissenschaften e.V.
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