Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1978-12-28
1981-07-21
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415914, 427 431, 427 44, 430272, 430296, 526298, 526304, 526310, G03C 168, B05D 306, G03C 170, C08F 2232
Patent
active
042799848
ABSTRACT:
A resist material used for forming a positive image by application of radiation, said material comprising as principal constituent poly(ethyl .alpha.-cyanoacrylate), poly(ethyl .alpha.-amidoacrylate) or a binary copolymer thereof or a ternary copolymer of poly(ethyl .alpha.-cyanoacrylate), poly(ethyl .alpha.-amidoacrylate) and polymethacrylonitrile. The minimum incident charge of radiation required for forming a desired resist pattern by use of this resist material is as low as 10.sup.-7 coulomb/cm.sup.2, or far lower than the level required in use of other known resist materials, and a positive resist image which can well stand the chromium etching solutions is obtained by short-time irradiation.
REFERENCES:
patent: 3897295 (1975-07-01), Dowbenko et al.
patent: 3948794 (1976-04-01), Konig
patent: 3984582 (1976-10-01), Feder et al.
patent: 4011351 (1977-03-01), Gipstein
patent: 4024293 (1977-06-01), Hatzakis
Canale et al., Journal of Applied Science, vol. IV, No. 11, pp. 231-236 (1960).
Kinsinger et al., Journal of Applied Science, vol. 9, pp. 129-137 (1965).
Honma Masami
Matsuda Shunsuke
Nagamatsu Gentaro
Tsuchiya Soji
Brammer Jack P.
Fuji Chemicals Industrial Co. Ltd.
Matsushita Electric - Industrial Co., Ltd.
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