Positive resist compositions and patterning process

Details Positive resist compositions and patterning process Positive resist compositions and patterning process

2011-08-09

2011-08-09

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S326000, C430S330000, C430S910000, C430S921000, C430S925000, C430S942000

Reexamination Certificate

active

07993811

ABSTRACT:
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units, represented by formula (1). The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution and forms a pattern with a satisfactory mask fidelity and a minimal LER.Herein R1is H or methyl, R2is an acid labile group, R3is CO2R4when X is CH2, R3is H or CO2R4when X is O, R4is a monovalent C1-C20hydrocarbon group, and m is 1 or 2.

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