Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-03-18
2008-03-18
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S967000, C430S966000, C430S296000, C430S921000, C430S914000
Reexamination Certificate
active
07344821
ABSTRACT:
A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increases a solubility of the resin (B) in an alkaline developer by an action of an acid, wherein the resin (B) comprises a repeating unit having an alicyclic group connected with a fluorine-substituted alcohol residue; and a pattern formation method using the composition.
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“ultraviolet.” Wikipedia, the free encyclopedia. Sep. 11, 2006. Reference.com http://www.reference.com/browse/wiki/Ultraviolet>>.
Vaishali R. Vohra et al., “Highly Transparent Resist Platforms for 157 nm Microlithography: An Update” (2002) Proceedings of SPIE, vol. 4690, pp. 84-93.
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FUJIFILM Corporation
Hamilton Cynthia
Sughrue & Mion, PLLC
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