Positive resist composition for immersion exposure, method...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S326000, C430S327000, C430S273100, C526S246000

Reexamination Certificate

active

07858288

ABSTRACT:
A fluorine-containing polymeric compound obtained by polymerizing only polymerizable monomers represented by general formula (c1-0) shown below:wherein R1represents a hydrogen atom or a methyl group; R2represents an aliphatic hydrocarbon group substituted with fluorine atoms, or a group in which a plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms are bonded through a linking group containing a hetero atom, with the proviso that at least one of the plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms is an aliphatic hydrocarbon group substituted with fluorine atoms.

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English translation of JP, 2001-100403, A (2001) from machine translation from AIPN Japan Patent Office National Center for Industrial Property Information and Training, generated Dec. 9, 2009, 16 pages.
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