Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-09-29
1996-09-03
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 534557, G03F 7023
Patent
active
055522564
ABSTRACT:
Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.
REFERENCES:
patent: 3130047 (1964-04-01), Uhlig et al.
patent: 4465768 (1984-08-01), Ueno et al.
patent: 4588671 (1986-05-01), Molodnyakov et al.
patent: 4661434 (1987-04-01), Iwasaki et al.
patent: 4701399 (1987-10-01), Nagano et al.
patent: 4883739 (1989-11-01), Sakaguchi et al.
patent: 5066564 (1991-11-01), Zertani et al.
patent: 5128231 (1992-07-01), Itoh et al.
patent: 5130392 (1992-07-01), Schwalm et al.
patent: 5141841 (1992-08-01), Wade
patent: 5147758 (1992-09-01), Smothers et al.
patent: 5151341 (1992-09-01), Kim
patent: 5169740 (1992-12-01), Ushirogouchi et al.
patent: 5358824 (1994-10-01), Tan et al.
Aviram Ari
Brunsvold William R.
Bucca Daniel
Conley, Jr. Willard E.
Seeger David E.
Bowers Jr. Charles L.
International Business Machines - Corporation
Young Christopher G.
LandOfFree
Positive resist composition containing naphthoquinonediazide com does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resist composition containing naphthoquinonediazide com, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition containing naphthoquinonediazide com will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1948947