Positive resist composition and resist pattern formation method

Details Positive resist composition and resist pattern formation method Positive resist composition and resist pattern formation method

2008-04-29

2008-04-29

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S170000, C430S905000, C430S910000

Reexamination Certificate

active

11123357

ABSTRACT:
A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional unit (a1) represented by general formula (I), a constitutional unit (a2) represented by general formula (II), and a constitutional unit (a3) having an acid dissociable dissolution inhibiting group,wherein R represents a hydrogen atom or a methyl group, and m represents an integer of 1 to 3,wherein R represents a hydrogen atom or a methyl group, and R1represents alkyl group having a carbon number of 1 to 5, and l represents an integer of 0 to 3.

REFERENCES:
patent: 5942367 (1999-08-01), Watanabe et al.
patent: 5976759 (1999-11-01), Urano et al.
patent: 6033826 (2000-03-01), Urano et al.
patent: 6143460 (2000-11-01), Kobayashi et al.
patent: 6432608 (2002-08-01), Fujie et al.
patent: 6627381 (2003-09-01), Uetanie et al.
patent: 6656660 (2003-12-01), Urano et al.
patent: 6723483 (2004-04-01), Oono et al.
patent: 6846609 (2005-01-01), Uetanie et al.
patent: 7005230 (2006-02-01), Yamamoto et al.
patent: 2002/0164540 (2002-11-01), Nakanishi et al.
patent: 2005/0042541 (2005-02-01), Hagihara et al.
patent: 2006/0251986 (2006-11-01), Sato et al.
patent: 1 357 284 (2002-08-01), None
patent: 2 356 258 (2001-05-01), None
patent: 04-211258 (1992-08-01), None
patent: 06-69118 (1994-03-01), None
patent: 11-119443 (1999-04-01), None
patent: 11-168052 (1999-06-01), None
patent: 2000-188250 (2000-07-01), None
patent: 2000-356850 (2000-12-01), None
patent: 2001-274062 (2001-10-01), None
patent: 2002-241442 (2002-01-01), None
patent: 2002-287363 (2002-10-01), None
patent: WO 00/46640 (2000-08-01), None
patent: WO 01/73512 (2001-10-01), None

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