Positive resist composition and resist pattern formation method

Details Positive resist composition and resist pattern formation method Positive resist composition and resist pattern formation method

2008-04-29

2008-04-29

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S170000, C430S905000, C430S910000

Reexamination Certificate

active

07364831

ABSTRACT:
A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional unit (a1) represented by general formula (I), a constitutional unit (a2) represented by general formula (II), and a constitutional unit (a3) having an acid dissociable dissolution inhibiting group,wherein R represents a hydrogen atom or a methyl group, and m represents an integer of 1 to 3,wherein R represents a hydrogen atom or a methyl group, and R1represents alkyl group having a carbon number of 1 to 5, and l represents an integer of 0 to 3.

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