Positive resist composition and patterning process

Details Positive resist composition and patterning process Positive resist composition and patterning process

2009-02-13

2011-11-22

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S907000, C430S910000, C430S942000

Reexamination Certificate

active

08062828

ABSTRACT:
A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.

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