Positive resist composition and pattern forming method using...

Details Positive resist composition and pattern forming method using... Positive resist composition and pattern forming method using...

2006-12-27

2009-06-23

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S913000, C430S311000

Reexamination Certificate

active

07550250

ABSTRACT:
A positive resist composition, which comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having a repeating unit represented by formula (C) as defined in the specification; and (D) a solvent, wherein a content of the resin as the component (C) is from 0.1 to 20 mass % based on a solid content of the positive resist composition, and a pattern forming method using the same.

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B.J. Lin “Semiconductor Foundry, Lithography, and Partners” Micropatterning Division TSMC, Inc., SPIE vol. 4688 (2002), pp. 11-24.
J.A. Hoffnagle, et al. “Liquid Immersion Deep-Ultraviolet Interferometric Lithography” J. Vac. Sci. Technol. B 17(6), Nov./Dec. 1998 American Vacuum Society, pp. 3306-3309.

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