Positive resist composition and pattern-forming method using...

Details Positive resist composition and pattern-forming method using... Positive resist composition and pattern-forming method using...

2006-09-13

2009-11-03

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S913000, C430S311000

Reexamination Certificate

active

07611820

ABSTRACT:
A positive resist composition comprises:(A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom;(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation,(C) a silicon atom-containing resin having at least one group selected from groups (X) to (Z),(X) an alkali-soluble group,(Y) a group capable of decomposing by action of an alkali developer to increase the solubility of resin (C) in an alkali developer,(Z) a group capable of decomposing by action of an acid to increase the solubility of resin (C) in an alkali developer; and(D) a solvent.

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