Positive resist composition and pattern forming method using...

Details Positive resist composition and pattern forming method using... Positive resist composition and pattern forming method using...

2011-06-07

2011-06-07

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S273100, C430S311000, C430S396000, C430S905000, C430S913000, C430S945000

Reexamination Certificate

active

07955780

ABSTRACT:
Provided is a positive resist composition using a resin having, in the polymer main chain, a specific acid decomposable structure and further having, in the side chain thereof, several specific acid decomposable groups, satisfactory in an exposure latitude, a focus latitude, and pattern collapse prevention at a high level, and having reduced development defects; and a pattern forming method.

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