Positive resist composition and pattern forming method

Details Positive resist composition and pattern forming method Positive resist composition and pattern forming method

2008-03-28

2010-02-23

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000

Reexamination Certificate

active

07666574

ABSTRACT:
A positive photosensitive composition comprises(A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid;(B) a compound generating an acid in irradiation with actinic light or radiation;(C) a resin that contains neither fluorine nor silicon and has a repeating unit having the predetermined structure; and(D) a solvent,wherein each symbol represents a predetermined group.

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Extended European Search Report dated Aug. 14, 2008.

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