Positive resist composition and pattern formation method...

Details Positive resist composition and pattern formation method... Positive resist composition and pattern formation method...

2007-03-26

2009-11-10

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S921000, C430S922000

Reexamination Certificate

active

07615330

ABSTRACT:
A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.

REFERENCES:
patent: 5310619 (1994-05-01), Crivello et al.
patent: 6680157 (2004-01-01), Fedynyshyn
patent: 7217492 (2007-05-01), Yoneda et al.
patent: 7374860 (2008-05-01), Hirano et al.
patent: 2004/0087690 (2004-05-01), Lamanna et al.
patent: 2007/0072117 (2007-03-01), Mizutani et al.
patent: 2007/0082289 (2007-04-01), Wada
patent: 2007/0141512 (2007-06-01), Wada et al.
patent: 0 898 201 (1999-02-01), None
patent: 1 480 078 (2004-11-01), None
patent: 10-083073 (1998-03-01), None
patent: 10-120610 (1998-05-01), None
patent: 10-310545 (1998-11-01), None
patent: 11-322656 (1999-11-01), None
patent: 2000-305270 (2000-11-01), None
patent: 2002-049154 (2002-02-01), None
patent: 2003-183227 (2003-07-01), None
patent: 2003-321423 (2003-11-01), None

Affiliated with

Also associated with

Rating

Positive resist composition and pattern formation method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition and pattern formation method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition and pattern formation method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4097412