Positive resist composition and pattern formation method...

Details Positive resist composition and pattern formation method... Positive resist composition and pattern formation method...

2007-10-23

2007-10-23

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S921000, C430S925000

Reexamination Certificate

active

10942852

ABSTRACT:
A positive resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid and (B-1) a compound having a structure represented by formula (I) defined in the specification.

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patent: WO 02/19033 (2002-03-01), None
patent: WO 02/39186 (2002-05-01), None
G. Pohlers et al., “Transparency vs. efficiency in 193 nm photoacid generator design” Proceedings of the SPIE—The International Society for Optical Engineering, vol. 4690, No. 1, Mar. 2002, pp. 179-190, XP002315331 USA (p. 182).
European Search Report dated Feb. 24, 2005.

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