Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-07-31
2007-07-31
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S910000
Reexamination Certificate
active
11041384
ABSTRACT:
A positive resist composition which can be suitably used in an ultramicrolithography process such as production of VLSI or high-capacity microchip and in other photofabrication processes and can ensure good sensitivity, resolution, pattern profile and line edge roughness when irradiated with actinic rays or radiation, particularly, electron beam, X-ray or EUV; and a pattern formation method using the composition, are provided, the positive resist composition comprising (A) a resin comprising a specific acryl-based repeating unit and a specific styrene-based repeating unit, which increases the dissolution rate in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a solvent; and a pattern formation method using the composition.
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Machine-assisted English translation of JP 2003-322970 (Hirayama et al) provided by JPO.
T. Fischer et al., Proc. SPIE, vol. 2483, pp. 53-60 (1995) Influence of acid generator structure on T-top formation in high temperature bake processes for environmental stabilization.
Akio Naka, “Resist Composition and Method for Forming Resist Pattern by Using the Same”, Patent Abstracts of Japan—2000 131847 (2000).
Juichi Takayama, “Positive Resist Composition and Method for Forming Pattern by Using the Same”, Patent Abstracts of Japan—2003 322970 (2003).
European Search Report dated Jun. 9, 2005.
Fujifilm Corporation
Lee Sin
Sughrue & Mion, PLLC
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